Terafab is not merely a larger fab. It is a thermodynamic rewrite of chipmaking.
By replacing point-of-use laser-produced plasma with utility-scale ERL-FEL infrastructure, the consortium turns lithographic light into a shared utility generated centrally and distributed across the fab.
That breaks dependence on the physical limits of tin-plasma sources and creates a tunable path toward 6.7 nm
Beyond EUV: adjust the accelerator’s electron energy, shift the photon wavelength, and drive the next generation of patterning.
The old model installs a light source inside every machine.
The Terafab model builds a photon power plant.
This is not just semiconductor scaling.
It is the industrialization of light.