meng(@meng59739449):1)This is true , because no BSPDN has to run tighter pitches have to use double patterning EUV 2)High NA EUV use industry standard 6x6 mask and then stitching has already been extremely derisked with the XT260 system 3)18A indeed outpacing A16 on BSPDN https://t.co/J0G7rGDoqB

2026.10.23 11:07

1)This is true , because no BSPDN has to run tighter pitches have to use double patterning EUV 2)High NA EUV use industry standard 6x6 mask and then stitching has already been extremely derisked with the XT260 system 3)18A indeed outpacing A16 on BSPDN