🎙️ NEW EPISODE: TSMC Will Buy High NA After All: ASML's New 6x12-Inch Mask Austin and Vik break down ASML's High NA EUV, whose anamorphic optics cut the exposure field in half, the new 6x12-inch masks that restore the full field size, and what the change means for the mask supply chain. - High NA uses anamorphic optics with 4x by 8x demagnification - A 12-inch mask restores the full 26mm x 33mm field size - Samsung targets High NA for DRAM in 2028, ahead of TSMC. TSMC is interested now though! - Intel is a million wafers deep on its High NA learning curve - Nearly 30% of ASML's revenue is recurring services income Chapters: 0:00 Episode Opening 2:23 The Rise of AI Agents 6:00 Instinct: The Autonomous Agent 10:50 Productizing AI for Mass Adoption 14:03 From AI Agents to ASML 24:29 The Photomask Stitching Problem 31:49 High NA's Anamorphic Optics Tradeoff 36:39 The Cost of a Halved Reticle 37:26 The 6x12-Inch Mask Solution 39:08 A Full Supply Chain Problem 41:17 TSMC, Samsung & Intel Timelines 48:24 Intel's EUV History Lesson Get more of Austin and Vik daily, free! Sign up: Connect with Vik and Austin: Vik's Paid Substack: Austin's Paid Substack: @austinsemis @vikramskr